Hole drift velocity in silicon

G. Ottaviani, L. Reggiani, C. Canali, F. Nava, and A. Alberigi-Quaranta
Phys. Rev. B 12, 3318 – Published 15 October 1975
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Abstract

Drift velocities for holes in high-purity Si were measured for fields between about 3 and 5×104 V/cm and temperatures between 6 and 300°K for the crystallogrphic directions 100, 110, and 111. The Ohmic mobility is theoretically interpreted on the basis of a two-band model consisting of a spherical parabolic and a spherical nonparabolic band, and the relaxation-time approximation. The low-temperature Ohmic mobility is strongly influenced by the nonparabolicity of the heavy-hole band. The high-field region (E103 V/cm) was analyzed using a single warped heavy-hole band model and a Monte Carlo technique. Anisotropy of hot-hole drift velocity is associated with warping of the valence band. Optical- and acoustic-scattering mechanisms are found to be of comparable strength.

  • Received 16 October 1974

DOI:https://doi.org/10.1103/PhysRevB.12.3318

©1975 American Physical Society

Authors & Affiliations

G. Ottaviani, L. Reggiani, C. Canali, F. Nava, and A. Alberigi-Quaranta

  • Istituto di Fisica dell'Università, Via Università 4, Modena, Italy

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Issue

Vol. 12, Iss. 8 — 15 October 1975

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