Abstract
Generation of dense electron-hole plasmas in silicon with intense 100-fs laser pulses is studied by time-resolved measurements of the optical reflectivity at 625 nm. For fluences F between plasma generation is dominated by strong two-photon absorption, and possibly higher-order nonlinearities, which lead to very steep spatial carrier distributions. The maximum carrier densities at the sample surface are in excess of and therefore, the reflectivity shows a mainly Drude-like free-carrier response. Within the Drude model, limits for the optical effective mass and the damping time are determined.
- Received 20 November 1998
DOI:https://doi.org/10.1103/PhysRevB.61.2643
©2000 American Physical Society