Step bunching of vicinal GaN(0001) surfaces during molecular beam epitaxy

M. H. Xie, S. H. Cheung, L. X. Zheng, Y. F. Ng, Huasheng Wu, N. Ohtani, and S. Y. Tong
Phys. Rev. B 61, 9983 – Published 15 April 2000
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Abstract

Step bunching of vicinal GaN(0001) surface during epitaxial growth is observed by scanning tunneling microscopy. Large step stiffness and repulsive step-step interaction are suggested based on step morphology observations. The size of the bunch changes with time, depending on the direction in which the substrate is heated by a direct current. This observation provides evidence for the electromigration effect causing the step bunching, and from the field dependence we infer that adatoms, which are likely N, have effective positive charges.

  • Received 22 November 1999

DOI:https://doi.org/10.1103/PhysRevB.61.9983

©2000 American Physical Society

Authors & Affiliations

M. H. Xie, S. H. Cheung, L. X. Zheng, Y. F. Ng, Huasheng Wu, N. Ohtani*, and S. Y. Tong

  • Department of Physics, The University of Hong Kong, Pokfulam Road, Hong Kong

  • *Also at Nippon Steel Corporation, Advanced Technology Research Laboratory, 5-10-1 Fuchinobe, Sagamihara 229-8551, Japan.

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Vol. 61, Iss. 15 — 15 April 2000

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