Theoretical current-voltage characteristics of ferroelectric tunnel junctions

H. Kohlstedt, N. A. Pertsev, J. Rodríguez Contreras, and R. Waser
Phys. Rev. B 72, 125341 – Published 29 September 2005

Abstract

We present the concept of ferroelectric tunnel junctions (FTJs). These junctions consist of two metal electrodes separated by a nanometer-thick ferroelectric barrier. The current-voltage characteristics of FTJs are analyzed under the assumption that the direct electron tunneling represents the dominant conduction mechanism. First, the influence of converse piezoelectric effect inherent in ferroelectric materials on the tunnel current is described. The calculations show that the lattice strains of piezoelectric origin modify the current-voltage relationship owing to strain-induced changes of the barrier thickness, electron effective mass, and position of the conduction-band edge. Remarkably, the conductance minimum becomes shifted from zero voltage due to the piezoelectric effect, and a strain-related resistive switching takes place after the polarization reversal in a ferroelectric barrier. Second, we analyze the influence of an internal electric field arising due to imperfect screening of polarization charges by electrons in metal electrodes. It is shown that, for asymmetric FTJs, this depolarizing-field effect also leads to a considerable change of the barrier resistance after the polarization reversal. However, the symmetry of the resulting current-voltage loop is different from that characteristic of the strain-related resistive switching. The crossover from one to another type of the hysteretic curve, which accompanies the increase of FTJ asymmetry, is described taking into account both the strain and depolarizing-field effects. It is noted that asymmetric FTJs with dissimilar top and bottom electrodes are preferable for the nonvolatile memory applications because of a larger resistance on/off ratio.

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  • Received 18 May 2004

DOI:https://doi.org/10.1103/PhysRevB.72.125341

©2005 American Physical Society

Authors & Affiliations

H. Kohlstedt1,4,*, N. A. Pertsev1,2, J. Rodríguez Contreras1, and R. Waser1,3

  • 1Institut für Festkörperforschung and CNI, Forschungszentrum Jülich, D-52425 Jülich, Germany
  • 2A. F. Ioffe Physico-Technical Institute, Russian Academy of Sciences, 194021 St. Petersburg, Russia
  • 3Institut für Werkstoffe der Elektrotechnik, RWTH Aachen University of Technology, D-52056 Aachen, Germany
  • 4Department of Material Science and Engineering and Department of Physics, University of California, Berkeley, California 94720, USA

  • *Electronic address: h.h.kohlstedt@fz-juelich.de

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Vol. 72, Iss. 12 — 15 September 2005

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