Superconductor-to-insulator transition in boron-doped diamond films grown using chemical vapor deposition

Akihiro Kawano, Hitoshi Ishiwata, Shingo Iriyama, Ryosuke Okada, Takahide Yamaguchi, Yoshihiko Takano, and Hiroshi Kawarada
Phys. Rev. B 82, 085318 – Published 16 August 2010

Abstract

The critical concentration of superconductor-to-insulator transition in boron-doped diamond is determined in two ways, namely, the actual doping concentration of boron and the Hall carrier concentration. Hall carrier concentrations in (111) and (001) films exceed the actual doping concentration owing to the distortion of the Fermi surface. The high critical boron concentration in (110) films is owing to the effect of the high concentration of interstitial boron atoms. A boron concentration of 3×1020cm3 in substitutional site is required for inducing superconductivity in diamond.

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  • Received 29 May 2010

DOI:https://doi.org/10.1103/PhysRevB.82.085318

©2010 American Physical Society

Authors & Affiliations

Akihiro Kawano1, Hitoshi Ishiwata1, Shingo Iriyama1, Ryosuke Okada1, Takahide Yamaguchi2, Yoshihiko Takano2, and Hiroshi Kawarada1

  • 1School of Science and Engineering, Waseda University, 3-4-1 Okubo, Shinjuku, Tokyo 169-8555, Japan
  • 2National Institute for Materials Science, 1-2-1 Sengen, Tsukuba 305-0047, Japan

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Issue

Vol. 82, Iss. 8 — 15 August 2010

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