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HomeMaterials Science ForumMaterials Science Forum Vols. 457-460Chemi-Mechanical Polishing of On-Axis...

Chemi-Mechanical Polishing of On-Axis Semi-Insulating SiC Substrates

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Silicon Carbide and Related Materials 2003

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Periodical:

Materials Science Forum (Volumes 457-460)

Pages:

805-808

DOI:

https://doi.org/10.4028/www.scientific.net/MSF.457-460.805

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Online since:

June 2004

Authors:

V.D. Heydemann, W.J. Everson, Rick D. Gamble, David Snyder, Marek Skowronski

Keywords:

Chemi-Mechanical Polishing, CMP, Polishing, Silicon Carbide (SiC), Substrate Surface Preparation, Subsurface Damage, Surface Damage, Surface Roughness (SR)

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