1984 年 35 巻 12 号 p. 590-594
Titanium nitride and carbide films were coated onto the inner walls of carbon steel or stainless steel tubes by chemical vapor deposition. The optimum deposition temperature and the reaction time to obtain a TiN film of 10μm thick were 1050°C and 60min, respectively. The film thickness distribution along the axial direction of the tubes (inside diameter: 6-10mm) was highly dependent on the flow rate of the reactant gas (TiCl4+N2+H2). At a linear flow rate of 80cm/sec, a relatively uniform TiN film was deposited over a length of 8cm along the axial direction, even in which a maximum of the film thickness appeared at the inlet side of the tube. TiN and TiC films, which deposited on both steel substrates, showed fine-grained microstructures with some extent of preferred orientation. These films were adherent to the steel substrates, and no cracks or pin-holes were observed even after dipping corrosion tests in various strong acids.